Projection Lithography and POM
| Make: | Lab India |
| Model: | Projection lithography and POM |
| Year of purchase: | 2015 |
| Funded by: | |
| Location: | Arkavathi |
| Contact email: | fablab@cens.res.in |
| Book New Request | |
- Projection Lithography: System to fabricate micro-sized electrode patterns and devices.
- - Different projection lens: 1x, 10x, 20x (Higher magnification lens to be used for smaller size features)
- Optical microscope: System to observe and study micro-size objects.
- - Different objective lens: 10x, 20x, 50x (Higher magnification lens to see smaller size features)
- Minimum feature size (with 10x) ~ 5-10 µm
- Maximum exposure area (with 10x) ~ 1mm2
- Feature size up to 1µm is expected from the instrument with proper optimization.
- Maximum exposure area can be increased with using 1x lens, but it requires more exposure time.
- Large area pattern (>1mm2) can also be made with manually stitching of the small parts of the pattern.
| Modes | Duration (hrs) |
|---|---|
| Projection lithography (1x, 10x, 20x) | 2 hrs |
| Optical microscope (top and bottom illumination) (10x, 20x, 50x) | 1 hr |
| Sl. No. - Category | Fees ( in Rs/- ) + additional 18% GST |
|---|---|
| 01 - Academic Institutes | 650 per slot / 2 hrs |
| 03 - External Industry Users | 1,300 per slot / 2 hrs |
| 02 - External Industry Partner | 975 per slot / 2 hrs |