Wet Bench
| Make: | Nano Clean Contamination Control system |
| Model: | Customized fabrication |
| Year of purchase: | 2015 |
| Funded by: | |
| Location: | Arkavathi |
| Contact email: | fablab@cens.res.in |
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- Fume hood with HEPA filters(0.3μm).
- Sonicator: 30/60 Hz duel frequency
- Hot plate: Maximum temperature 250oC
- Spin coater: 8000rpm
- Ozone cleaner: 400W UV lamp
- Hot air Oven: 50-350 C
- Wet bench instruments to be used for optical lithography experiments.
- Fume hood and HEPA filters: To avoid dust.
- Spin coater: To coat the photoresist on the substrate.
- Hotplate: To soft bake and hardback of the photoresist.
- Sonicator: Used for the lift-off.
- Ozone cleaner: To make substrate surface hydrophilic.
| Modes | Duration (hrs) |
|---|---|
| Wet bench for lithography | 3 hrs |
| Sl. No. - Category | Fees ( in Rs/- ) + additional 18% GST |
|---|---|
| 03 - Industry | Rs. 2000/- per hr |
| 01 - Other Academia | Rs. 1000/- per hr |
| 02 - Industry partner | Rs. 1500/- per hr |