Projection Lithography and POM
Projection Lithography and POM
Make: Lab India
Model: Projection lithography and POM
Year of purchase: 2015
Funded by:
Location: Arkavathi
Contact email: fablab@cens.res.in
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  • Projection Lithography: System to fabricate micro-sized electrode patterns and devices.
  • - Different projection lens: 1x, 10x, 20x (Higher magnification lens to be used for smaller size features)
  • Optical microscope: System to observe and study micro-size objects.
  • - Different objective lens: 10x, 20x, 50x (Higher magnification lens to see smaller size features)
  • Minimum feature size (with 10x) ~ 5-10 µm
  • Maximum exposure area (with 10x) ~ 1mm2
  • Feature size up to 1µm is expected from the instrument with proper optimization.
  • Maximum exposure area can be increased with using 1x lens, but it requires more exposure time.
  • Large area pattern (>1mm2) can also be made with manually stitching of the small parts of the pattern.
Modes Duration (hrs)
Projection lithography (1x, 10x, 20x) 2 hrs
Optical microscope (top and bottom illumination) (10x, 20x, 50x) 1 hr
Sl. No. - Category Fees ( in Rs/- ) + additional 18% GST
06 - Industry - Facility usage with Assistance ₹ 5000 for 6 hours usage
02 - Other Academia - Facility usage with Assistance ₹ 3000 for 6 hours usage
05 - Industry - Facility visit and 1st level training ₹ 2000 per person
04 - Industry partner - Facility usage with Assistance ₹ 4000 for 6 hours usage
01 - Other Academia - Facility visit and 1st level training ₹ 1500 per person
03 - Industry partner - Facility visit and 1st level training ₹ 2000 per person