ITO/AZO Sputtering System
ITO/AZO Sputtering System
Make: HHV
Model: ITO/ AZOsputtering system
Year of purchase: 2017
Funded by:
Location: Arkavathi
Contact email:
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  • Dual magnetron (ITO/AZO) oxide sputtering
  • 100mm substrate holder
  • Substrate heating up to 300oC
  • ITO/AZO of ~ 10Ohms resistance with the transmission of ~90%
  • D shape chamber 400 (dia) x 500mm(height)
  • 3” flexible sputter sources with high power Nd-Fe-B magnets insulated with water
  • Adjustable till angle 45o
  • Base pressure ~10-7 mbar
  • Operating pressure from 5 × 10-4 to 1 × 10-2 mbar
  • Magnetron cathodes are arranged in sputter up configuration
  • DC Power supply
  • -Output current/Voltage: 0-2A (DC)/105-1000V (DC)
  • - Power rating: 2 kW (DC)
  • Substrate rotation: 20rpm
  • Mass flow controller : 2-100sccm
  • Dry scroll pump (EDWARDS nXDS10i) and Turbomolecular pump (nEXT400D)
  • Electromagnetically operated vent valve
  • Liquid Nitrogen Trap
  • Deposition of transparent and conducing ITO and AZO films of ~ 10 Ohms resistance with transmission of ~90%
Modes Duration (hrs)
Manual 2 hrs
Sl. No. - Category Fees ( in Rs/- ) + additional 18% GST
03 - Industry 3000 per hour
01 - Other Academia 2000 per hour
02 - Industry partner 2500 per hour
04 - Max substrate size 2cmx2cm User Charges subject to change depending on sample size and thickness