ITO/AZO Sputtering System
| Make: | HHV |
| Model: | ITO/ AZOsputtering system |
| Year of purchase: | 2017 |
| Funded by: | |
| Location: | Arkavathi |
| Contact email: | |
| Book New Request | |
- Dual magnetron (ITO/AZO) oxide sputtering
- 100mm substrate holder
- Substrate heating up to 300oC
- ITO/AZO of ~ 10Ohms resistance with the transmission of ~90%
- D shape chamber 400 (dia) x 500mm(height)
- 3” flexible sputter sources with high power Nd-Fe-B magnets insulated with water
- Adjustable till angle 45o
- Base pressure ~10-7 mbar
- Operating pressure from 5 × 10-4 to 1 × 10-2 mbar
- Magnetron cathodes are arranged in sputter up configuration
- DC Power supply
- -Output current/Voltage: 0-2A (DC)/105-1000V (DC)
- - Power rating: 2 kW (DC)
- Substrate rotation: 20rpm
- Mass flow controller : 2-100sccm
- Dry scroll pump (EDWARDS nXDS10i) and Turbomolecular pump (nEXT400D)
- Electromagnetically operated vent valve
- Liquid Nitrogen Trap
- Deposition of transparent and conducing ITO and AZO films of ~ 10 Ohms resistance with transmission of ~90%
| Modes | Duration (hrs) |
|---|---|
| Manual | 2 hrs |
| Sl. No. - Category | Fees ( in Rs/- ) + additional 18% GST |
|---|---|
| 03 - Industry | 3000 per hour |
| 01 - Other Academia | 2000 per hour |
| 02 - Industry partner | 2500 per hour |
| 04 - Max substrate size | 2cmx2cm User Charges subject to change depending on sample size and thickness |